Development of Measuring Apparatus for Laser Plume Force and its Applications
Masami Futamata, Hiroshi Shimizu, Xizhuang Han, Akira Matunawa
This study presents new measuring apparatus which can be applied to in-process measurement of plume reaction force in laser materials processing. The principle of measuring apparatus is based on the load-cell device of parallel beams structure type which has a high stability and high detection sensitivity.
In this paper, an effectiveness of new measuring apparatus, the relationship between plume reaction force and irradiation conditions of pulsed Nd-glass laser and target materials were investigated. As the results, it was found that the measuring apparatus developed by us appears to be useful for the analysis of plume reaction force. The plume reaction force increased with increasing output power, decreased with increasing pulse duration. Furthermore the force depended on the value of focal length, focal condition and the kinds of target material.